UNIXX H760
(21x21 inch) Stand-alone hotplate system up to 537 x 537mm or customized rectangular substrates.

UNIXX H760 (21x21 inch) Stand-alone hotplate system up to 537 x 537mm or customized rectangular substrates.

OSIRIS SKU: UNIXX H760
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UNIXX-SERIES
  • Spin & spray coater, developer, temperature and smartEBR modules are available as stand-alone, table-top or bench mounted configurations.
  • Base frame design allows various process modules configurations.
  • Round wafer up to Ø300 mm (Ø12 inch)
  • Square substrate size up to 230 x 230 mm (9 x 9 inch)

The product range also offers customized single processing systems for large substrates up to 1.300 x 1.300 mm (51 x 51 inch). Optional sub-systems; PR dispense systems (pumps, syringe or CPD).

HOTPLATES Designed to be used in applications: SOFTBAKE (PRE-BAKE), HARDBAKE, OPTIONAL FOR HMDS (HEXAMETHYLDISILAZANE): VAPOR PRIMING, VACUUM DRYING

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