Unitemp Germany Rapid Thermal Annealing Ovens - Nano Vacuum Australia & New Zealand

Rapid Thermal Annealing Ovens

6 products

    High precision Rapid Thermal Annealer (RTA) or Rapid Thermal Processor (RTP) Ovens are used for several applications including annealing of silicon and compound semiconductor wafers or devices, Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN), Rapid Thermal Diffusion from spin-on dopant, Crystallization, contact alloying and more.

    Our RTPs can reach up to 1200C with a maximum ramp rate of 150K/s down to 10E-6 mbar/hPa with a maximum substrate size of 156 x 156mm or 150mm diameter (depending on model).

    6 products
    RTP-100 Rapid Thermal Annealing (RTA/RTP) Oven - Nano Vacuum Australia & New Zealand
    RTP-100 Rapid Thermal Annealing Oven
    Unitemp Germany
    RTP-100-HV Rapid Thermal Annealing Oven (High Vacuum) - Nano Vacuum Australia & New Zealand
    RTP-100-HV Rapid Thermal Annealing Oven (High Vacuum)
    Unitemp Germany
    RTP-150 Rapid Thermal Annealing Oven (RTA/RTP) - Nano Vacuum Australia & New Zealand
    RTP-150 Rapid Thermal Annealing Oven
    Unitemp Germany
    RTP-150-EP Rapid Thermal Annealing Oven (RTA/RTP) - Nano Vacuum Australia & New Zealand
    RTP-150-EP Rapid Thermal Annealing Oven
    Unitemp Germany
    RTP-150-HV Rapid Thermal Annealing (RTA/RTP) Oven (High Vacuum) - Nano Vacuum Australia & New Zealand
    RTP-150-HV Rapid Thermal Annealing Oven (High Vacuum)
    Unitemp Germany
    VPO-300 Auto Load Rapid Thermal Annealing (RTA/RTP) Oven - Nano Vacuum Australia & New Zealand
    VPO-300 Auto Load Rapid Thermal Annealing Oven
    Unitemp Germany

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