Etching Systems

Etching systems are used to selectively remove or etch materials on a nano/atomic level. Oxford Instruments & Moorfield Nanotechnology manufacture a range of etching tools for various applications. Techniques include:

  • Reactive Ion Etch (RIE)
  • Inductively Coupled Plasma Reactive Ion Etch (ICP-RIE)
  • Deep Silicon Etch
  • BOSCH Process Si Etch
  • Ion Beam Etch (IBE)
  • Atomic Layer Etch (ALE) 

Etching Systems

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The PlasmaPro 100 Estrelas platform is designed to give total flexibility for Deep Silicon Etch (DSiE) applications -...
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