Etching Systems

Etching systems are used to selectively remove or etch materials on a nano/atomic level. Oxford Instruments & Moorfield Nanotechnology manufacture a range of etching tools for various applications. Techniques include:

  • Reactive Ion Etch (RIE)
  • Inductively Coupled Plasma Reactive Ion Etch (ICP-RIE)
  • Deep Silicon Etch
  • BOSCH Process Si Etch
  • Ion Beam Etch (IBE)
  • Atomic Layer Etch (ALE) 

Etching Systems

$POR
The PlasmaPro 800 offers a flexible solution for reactive ion etching (RIE) processes on large wafer batches and...
$POR
The PlasmaPro 100 RIE modules deliver anisotropic dry etching for an extensive range of processes. Compatible with all...
$POR
The PlasmaPro 80 reactive ion etch (RIE) is a compact, small footprint system offering versatile etch and deposition...
$POR
$POR
$POR
Showing: 1 -3 of 3
Spinner