ALD Systems

Oxford Instruments’ ALD product family offers a unique range of flexibility and capability in the engineering of nanoscale structures and devices by combining remote plasma ALD processes with thermal ALD.

The OpAL system introduces a unique open load thermal atomic layer deposition (ALD) tool with plasma option. It has a clear and easy upgrade route to plasma, providing both plasma and thermal ALD in a single compact tool.

The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition (ALD) processes and thermal ALD within a single ALD system.

ALD Systems

GEMStar XTTM family produces best in class ALD films from high aspect ratio particles through 200mm substrates both...
GEMStar XTTM family produces best in class ALD films from high aspect ratio particles through 200mm substrates both...
GEMStar XTTM family produces best in class ALD films from high aspect ratio particles through 200mm substrates both...
$POR
The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and...
$POR
The OpAL system introduces a unique open load thermal atomic layer deposition (ALD) tool with plasma option. It...
$POR
$POR
$POR
Showing: 1 -5 of 5
Spinner