ALD Systems

Oxford Instruments’ ALD product family offers a unique range of flexibility and capability in the engineering of nanoscale structures and devices by combining remote plasma ALD processes with thermal ALD.

The OpAL system introduces a unique open load thermal atomic layer deposition (ALD) tool with plasma option. It has a clear and easy upgrade route to plasma, providing both plasma and thermal ALD in a single compact tool.

The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition (ALD) processes and thermal ALD within a single ALD system.

ALD Systems

$POR
The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and...
$POR
The OpAL system introduces a unique open load thermal atomic layer deposition (ALD) tool with plasma option. It...
$POR
$POR
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