PlasmaPro 100 ICPCVD

Oxford Instruments Plasma SKU: PlasmaPro100ICPCVD
PlasmaPro 100 ICPCVD - Nano Vacuum

PlasmaPro 100 ICPCVD

Oxford Instruments Plasma SKU: PlasmaPro100ICPCVD
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The ICP CVD process module is designed to produce high quality films from room temperature to 400°C with high density plasmas at low deposition pressures and temperatures.

  • Excellent uniformity, high throughput and high precision processes

  • High quality films
  • Wide temperature range electrode
  • Compatible with all wafer sizes up to 200mm
  • Rapid change between wafer sizes
  • Low cost of ownership and ease of serviceability
  • Compact footprint, flexible layout
  • Resistive heated electrodes with capability up to 400°C or 1200°C
  • In-situ chamber cleaning and end-pointing

    Features & Benefits

    • Excellent quality low damage films at reduced temperatures.
    • Typical materials deposited include SiO2, Si3N4 and SiON, Si and SiC at substrate temperatures as low as 5ºC
    • ICP source sizes of 65mm, 180mm, 300mm delivering process uniformity
      up to 200mm wafers
    • Electrodes available for temperature ranges from 5ºC to 400ºC
    • Patented ICPCVD gas distribution technology
    • In situ chamber cleaning with endpointing

    Upgrades/Accessories

    Dry pump N2 standby mode - Saves energy and nitrogen

    Gas pod - incorporate extra gas lines and allow greater flexibility

    Logviewer software - datalogging software allows realtime graphing and post run analysis

    Optical end point detectors - an important tool for achieving optimal process results

    Soft pump - allows the slow pumping down of a vacuum chamber

    Turbomolecular vacuum pump - offers superior pumping speeds and higher throughput

    X20 Control System - delivers a future proof, flexible and reliable tool with increased system ‘intellect’

    Advanced Energy Paramount generator - Offering increased reliability and greater plasma stability

    Automatic pressure control - This controller ensures very fast and accurate pressure control

    Dual CM gauge switching - provides the ability to utilise two differing ranges of capacitance manometer via a single pressure control valve

    LN2 autochangeover unit - enables table cooling fluid to be automatically switched between Liquid Nitrogen (LN2) and Chiller Fluid

    TEOS liquid level sensing - level sensing is achieved using ultra sonic level sensors fitted to the TEOS canister

    Wide temperature range electrode - significant design improvements to increase process performance

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