PlasmaPro 100 Nano CVD

Chemical Vapour Deposition (CVD) & PECVD tools for growth of 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) delivers high-performance growth of nanomaterials with in-situ catalyst activation and rigorous process control, with flexible temperatures up to 1200°C.

Features

• Excellent uniformity with flexible temperatures up to 1200°C

• Options of a 700°C, 800°C or 1200°C table

• Sample sizes up to 200mm

• Vacuum load lock - Quick sample exchange

• Cold wall design with showerhead based uniform precursor delivery

• Optional liquid/solid source delivery system for growth of MoS₂,MoSe₂ and other TMDCs

Applications

• 2D materials growth
• MoS₂ growth
• Graphene growth
• hBN Growth
• 1D materials growth
• Carbon nano tube (CNT) growth

Download the brochure here