PlasmaPro 100 Nano CVD

Oxford Instruments Plasma SKU: PlasmaPro100nanoCVD
PlasmaPro 100 Nano CVD - Nano Vacuum Australia & New Zealand
PlasmaPro 100 Nano CVD - Nano Vacuum Australia & New Zealand

PlasmaPro 100 Nano CVD

Oxford Instruments Plasma SKU: PlasmaPro100nanoCVD
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Chemical Vapour Deposition (CVD) & PECVD tools for growth of 1D/2D nanomaterials and heterostructures. PlasmaPro 100 Nano (formerly Nanofab) delivers high-performance growth of nanomaterials with in-situ catalyst activation and rigorous process control, with flexible temperatures up to 1200°C.

Features

  • Excellent uniformity with flexible temperatures up to 1200°C

  • Options of a 700°C, 800°C or 1200°C table
  • Sample sizes up to 200mm

  • Vacuum load lock - Quick sample exchange

  • Cold wall design with showerhead based uniform precursor delivery
  • Optional liquid/solid source delivery system for growth of MoS2,MoSe2 and other TMDCs

Applications

Download the brochure here

 

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