nanoDEP Physical Vapour Deposition (PVD)
The nanoDEP Physical Vapour Deposition (PVD) system is a cost-effective, compact, high-vacuum evaporator for metal and/or organic materials.
The system comes as standard with one-touch automatic pump down and vent routines. The deposition control can either be manual or fully automatic to suit your budget.
All materials have been carefully selected and engineered for high vacuum compatibility and minimal outgassing for quick pump down times to high vacuum pressure regimes.
A large 15" touch screen HMI allows for easy intuitive control of the vacuum and deposition control operation.
All nanoDEP systems are engineered and assembled within our Sydney headquarters and backed by market leading 2 year warranty.
Typical applications include metal electrical contacts for Quantum computing, wearable electronics, photovoltaics, perovskite solar cells, OLEDs, OPVs, and OFETS. Organic active layers in perovskite solar cells, OLEDs, OPVs, and OFETS.
Substrate Size & Uniformity
4" Diameter max or smaller pieces
+/- 5% uniformity across 4" Diameter substrate
3x Metal only
4x 1cc Organic only
2x Metal plus 2x Organic
Max Source Temperatures
Metal = 1800C
Organic = 600C
Yes - Max either two Metals or two Organic sources
Vacuum Pumping System
Turbo molecular pump (field serviceable) backed by oil free dry scroll pump
Vacuum and water flow
Metals = Au, Ag, Al, Cu, Ti, Cr....etc
Organics = Small molecules ALQ3, C60...etc
Country of Manufacture