Aluminium Oxide Sputter Target [Al2O3]

NanoVac SKU: SP-AL2O3-1-8-4N
Aluminium Oxide Sputter Target [Al2O3] - Nano Vacuum

Aluminium Oxide Sputter Target [Al2O3]

NanoVac SKU: SP-AL2O3-1-8-4N
Your inquiry was submitted successfully. You can expect to hear from us shortly.

Aluminium Oxide Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.
Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.
Available in pre-bonded assemblies with OFHC Cu backing plate and indium bonding. Please note that the Cu backing plate will add another 1/8" (3mm) to the target thickness (Total Target Thickness = 1/4" or 6.35mm).
If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation.
All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.
Materials are vacuum packed under cleanroom conditions to ensure zero contamination.
If your size, quantity or purity is not available please contact us for a personalised quotation.

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.


Recently viewed