Aluminium Oxide Sputter Target [Al2O3]

NanoVac SKU: SP-AL2O3-1-8-4N
Aluminium Oxide Sputter Target [Al2O3] - Nano Vacuum

Aluminium Oxide Sputter Target [Al2O3]

NanoVac SKU: SP-AL2O3-1-8-4N
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Aluminium Oxide Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.
Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.
Available in pre-bonded assemblies with OFHC Cu backing plate and indium bonding. Please note that the Cu backing plate will add another 1/8" (3mm) to the target thickness (Total Target Thickness = 1/4" or 6.35mm).
If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation.
All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.
Materials are vacuum packed under cleanroom conditions to ensure zero contamination.
If your size, quantity or purity is not available please contact us for a personalised quotation.


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