How To Plasma Etch Silicon Carbide (SiC) To Achieve Maximum Device Performance

by Sarah Bowles

Dr Mark Dineen, technical marketing manager at Oxford Instruments has more than 20 years of experience in plasma technologies including ALD, ALE, CVD, ICP, PECVD and RIE processing. In this webinar by Oxford Instruments Plasma Technology, Mark shares his experiences on efficient plasma etching techniques to achieve deep SiC vias. 

Silicon Carbide (SiC) is becoming well established within power device manufacturers as it offers compelling advantages vs Si in several applications. 

Manufacturing SiC devices require expert knowledge of plasma processing techniques in order to maximise device performance, watch this webinar to discover more about these techniques. 


This webinar covers:  

  • How to achieve precision features on SiC surfaces 
  • Fast and efficient plasma etching techniques to achieve deep SiC vias 

View Webinar Here

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