μMLA The Table-Top Maskless Aligner

Brand: Heidelberg Instruments

Product Code: uMLA

Availability:Out of stock

NEW: The table-top system µMLA features our state-of-the-art maskless technology and is the perfect entry-level tool for Research & Development, in virtually all areas that require microstructures. Typical examples are Microfluidics, Micro Optics, Sensors, MEMS, and Material Science. The µMLA is flexible and customizable like no other table-top direct writing tool before and supports the use of millimeter-sized samples.

Select the exposure mode you need or even equip your µMLA with both: The Raster Scan Exposure Module provides fast exposure with a speed independent of design complexity. The Vector Module exposes continuous curves, creating smooth contours vital for applications such as waveguides. In addition, the µMLA offers a choice of 2 optical setups with different ranges of throughput and variable resolution. Within your optical setup the software allows easy switching between three configurations, optimizing resolution and speed according to your requirements.

 

For additional information please download the Fact Sheet or contact us at Nano Vacuum Australia & New Zealand.

 

Key Features

  • Substrate size: from 5 mm to 5”
  • Minimum feature size: down to 0.6 µm
  • Maximum write speed (at 4 µm resolution): 200 mm2/min
  • Real-time autofocus system
  • Frontside alignment
  • Easy-to-use operating software
  • 2 available optical setups
  • Choice of exposure Module: Raster and/or Vector scan
  • Variable resolution
  • Draw Mode
  • Wavelengths (Raster Scan): 390 nm or 365 nm exposure wavelength
  • Wavelengths (Vector Scan): 405 nm and/or 375 nm
  • Overview camera for alignment and inspection