Application of DWL66+ grayscale lithography in micro-optical element fabrication

A novel study by Prof Menon and his team on micro-optical element fabrication

The findings push photolithography and imaging beyond the diffraction limit and developing optical elements for photovoltaic systems. In this project, the multi-level diffractive lens was patterned using grayscale-optical lithography via a laser-pattern generator, DWL 66+ Heidelberg Instruments. 

You can read more: Large-area, high-numerical-aperture multi-level diffractive lens via inverse design, Journal of Optica, 2020

MDL fabricated image reference: M.Meem et al, Optica, 2020.