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Application of DWL66+ grayscale lithography in micro-optical element fabrication

A novel study by Prof Menon and his team on micro-optical element fabrication

The findings push photolithography and imaging beyond the diffraction limit and developing optical elements for photovoltaic systems. In this project, the multi-level diffractive lens was patterned using grayscale-optical lithography via a laser-pattern generator, DWL 66+ Heidelberg Instruments

You can read more: Large-area, high-numerical-aperture multi-level diffractive lens via inverse design, Journal of Optica, 2020

MDL fabricated image reference: M.Meem et al, Optica, 2020. 


  • Jun 02, 2020
  • Category: News
  • Comments: 0
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