UNIXX D20 Advanced (Ø200mm) Stand-alone system with movable splash ring for manual load-/unload of single substrates.

• Spin & spray coater, developer, temperature and smartEBR modules are available as stand-alone, table-top or bench mounted configurations.
• Base frame design allows various process modules configurations.
• Round wafer up to Ø300 mm (Ø12 inch)
• Square substrate size up to 230 x 230 mm (9 x 9 inch)

The product range also offers customized single processing systems for large substrates up to 1.300 x 1.300 mm (51 x 51 inch). Optional sub-systems; PR dispense systems (pumps, syringe or CPD).

DEVELOPER Designed to be used in applications: DEVELOPING, CLEANING AND DRYING(CCP)