High Quality InP-based Etching: Achieving Smooth Surface Using Controlled Processing-Oxford Instruments
Indium phosphide (InP), the direct bandgap semiconductor, has multiple uses in optical and electrical devices. For a good quality final product, the InP dry etch step must repeatedly give the desired etched structures.
For many devices, the low surface damage and the surface quality of the sidewalls and base are particularly important.
In this webinar, Dr Katie Hore, described two InP etching processes, CH4/Cl2/H2 and Cl2/Ar and the process conditions which affect the final etch product focusing on sidewall and surface quality, with device examples. She also detailed the uses of optical and laser endpointing for InP etching.