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The NanoFrazor uses thermal scanning probe lithography (t-SPL) for the simultaneous patterning and inspection of nanoscale structures, as well as direct laser sublimation (DLS) for mix & match lithography on a surface, namely on thermal resists. The NanoFrazor technology has proven its value as an enabler of novel ultra-high resolution nanodevices, as well as an asset for improving the performance of existing device concepts. In doing so, the NanoFrazor is establishing itself as a mature direct-write nanolithography tool, as well as a complementary extension to other mask-less nanolithography methods such as electron beam lithography (EBL).

The range of applications for t-SPL is very broad, spanning from ultra-high resolution 2D and 3D patterning, to chemical and physical modification of matter at the nanoscale. Nanometer-precise markerless overlay and non-invasiveness to sensitive materials are among the key strengths of the technology. The overlay is shown to work with sub-5nm precision even for nanowires and 2D material flakes that are buried under resist layers, thanks to the highly sensitive in-situ reading capability of the NanoFrazor tool. These unique capabilities allow for the realization of novel nanodevices with emerging 1D and 2D materials, and for nanometer-precise 3D (grayscale) surfaces in optics and fluidics.

In this live webinar, Dr. Jana Chaaban will explain the working principle of the NanoFrazor lithography, and highlight  key applications that utilize the unique patterning capabilities of the NanoFrazor technology.

Date: Tuesday, April 19, 2022
Time: 9:15 am CEST
Duration: approx. 45 minutes
Presenter: Dr. Jana  Chaaban, Technology and Applications Engineer at Heidelberg Instruments Nano

There will also be a Q&A session at the end of the webinar to address any questions you may have.

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