Maskless Aligner - Fast prototyping without photo masks
The Maskless Aligner series was first introduced in 2015. Since then, the maskless technology has become firmly established in research labs worldwide as well as in many small to mid-volume micro fabrication facilities. Application areas include MEMS, microfluidics, micro-optics, sensors, electronic components and many more. This webinar will give you an insight into our maskless lithography technology with emphasis on our maskless aligner series.
Please click here for the invitation link for the MLA webinar:
Thursday June 24th - 5pm AEST
Up coming sessions with Nano Vacuum/ Heidelberg Instruments:
DWL - Research & Industrial Grayscale Lithography Tool
ULTRA Laser Writer - Volume Pattern Generators
NanoFrazor - A Nanolithography Tool for 2D & 3D devices
LithoProf3D-GSII - 3D Lithography via Two-Photon Polymerization
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