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Maskless Aligner - Fast prototyping without photo masks

The Maskless Aligner series was first introduced in 2015. Since then, the maskless technology has become firmly established in research labs worldwide as well as in many small to mid-volume micro fabrication facilities. Application areas include MEMS, microfluidics, micro-optics, sensors, electronic components and many more. This webinar will give you an insight into our maskless lithography technology with emphasis on our maskless aligner series.

Please click here for the invitation link for the MLA webinar:

Thursday June 24th - 5pm AEST

 

   

Up coming sessions with Nano Vacuum/ Heidelberg Instruments:

 DWL - Research & Industrial Grayscale Lithography Tool

ULTRA Laser Writer - Volume Pattern Generators

NanoFrazor - A Nanolithography Tool for 2D & 3D devices

LithoProf3D-GSII - 3D Lithography via Two-Photon Polymerization

  • Jun 15, 2021
  • Category: News
  • Comments: 0
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