Atomic Layer Deposition for Quantum Devices

by Ava Faridi

As the transistor gave rise to the information age, quantum technology has the potential to be the next great leap forward. Quantum technology is the application of quantum physics for real-world applications, such as quantum computing, sensing, navigation and communication.

Conventional methods for depositing superconductors include sputtering, pulsed laser deposition (PLD), and chemical vapour deposition (CVD). However, these methods can suffer from drawbacks including a lack of thickness control, poor uniformity and high impurity content.

Atomic layer deposition (ALD) is much more beneficial for thin-film deposition due to its ability to produce films with high purity, precise thickness control, conformal coating in high aspect ratio structures, and uniformity over large-area substrates. 

The properties of the materials used to produce quantum technology is of paramount importance to its operation. It has been shown that ALD can allow for fine control of these properties such as composition, resistance, Tc and film stress. Thus, ALD can be a driving force behind the development of technologies for quantum applications and the ability of Oxford Instruments' ALD tools to apply a bias during processes could be a route to further enhance the materials used in quantum technology.

For more information on ALD please download brochure, visit products or contact Nano Vacuum Australia & New Zealand at:

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