Application of Maskless Aligner MLA150 for patterning conductive tracks

by Ava Faridi

The result of Heidelberg MLA150 Maskless Aligner is presented in a novel study on Photolithography–Enabled Direct Patterning of Liquid Metals by Prof Kalantar-Zadeh and his team. 

Non-contact exposure, outstanding ease of use, and high speed make the Maskless Aligner MLA150 the ideal tool in rapid prototyping environments, for low- to mid-volume production, and in Research & Development. 

Maskless photolithography eliminates the need for a photomask: The system exposes the pattern directly onto the resist-covered surface. Should design modifications be required, these can be quickly implemented by changing the CAD layout, resulting in much-reduced cycle-times. You will also benefit from a fast, automated front- and backside alignment procedure as well as the outstanding speed. The application areas of the MLA150 include life sciences, MEMS, micro-optics, semiconductors, sensors, actuators, MOEMS, material research, nano-tubes, and graphene.

Download brochure here. 

 

Photolithography–Enabled Direct Patterning of Liquid Metals

R.Abbasi, et al. Photolithography–Enabled Direct Patterning of Liquid Metals, J. Mater. Chem. C, 2020

 

Back to News

Share this

Explore more

Popular posts