The result of Heidelberg MLA150 Maskless Aligner is presented in a novel study on Photolithography–Enabled Direct Patterning of Liquid Metals by Prof Kalantar-Zadeh and his team.
Non-contact exposure, outstanding ease of use, and high speed make the Maskless Aligner MLA150 the ideal tool in rapid prototyping environments, for low- to mid-volume production, and in Research & Development.
Maskless photolithography eliminates the need for a photomask: The system exposes the pattern directly onto the resist-covered surface. Should design modifications be required, these can be quickly implemented by changing the CAD layout, resulting in much-reduced cycle-times. You will also benefit from a fast, automated front- and backside alignment procedure as well as the outstanding speed. The application areas of the MLA150 include life sciences, MEMS, micro-optics, semiconductors, sensors, actuators, MOEMS, material research, nano-tubes, and graphene.
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R.Abbasi, et al. Photolithography–Enabled Direct Patterning of Liquid Metals, J. Mater. Chem. C, 2020