Oxford Instruments Plasma Technologies

Oxford Instruments manufactures etch and deposition solutions for nanometre sized features, nanolayers and the controlled growth of nanostructures. These solutions are based on core technologies in plasma, ion beam and atomic layer deposition and etch. Products range from clustered cassette-to-cassette platforms for high-throughput production processing to compact stand-alone systems for R&D. Oxford Instruments has enabled the research community to invent and innovate for the past 30 years. By constantly introducing new ideas and developing new solutions we have been able to continually push what is possible without tools, truly changing the art of the possible.

Oxford Instruments Plasma Technologies

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The PlasmaPro 800 offers a flexible solution for reactive ion etching (RIE) processes on large wafer batches and...
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The PlasmaPro 800 offers a flexible solution for reactive ion etching (RIE) processes on large wafer batches and...
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The PlasmaPro 80 reactive ion etch (RIE) is a compact, small footprint system offering versatile etch and deposition...
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The PlasmaPro 80 is a compact, small footprint system offering versatile etch and deposition solutions with convenient open...
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The PlasmaPro 80 is a compact, small footprint system offering versatile etch and deposition solutions with convenient open...
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The PlasmaPro 80 ICP is a compact, small footprint system offering versatile ICP etch solutions with convenient open...
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The PlasmaPro 80 is a compact, small footprint system offering versatile etch and deposition solutions with convenient open...
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The PlasmaPro 100 RIE modules deliver anisotropic dry etching for an extensive range of processes. Compatible with all...
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An evolution in single wafer etch technology. With extensive experience of etching materials such as GaN, SiC and...
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The PECVD process modules are specifically designed to produce excellent uniformity and high rate films, with control of...
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The ICP CVD process module is designed to produce high quality films from room temperature to 400°C with...
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The PlasmaPro 100 Estrelas platform is designed to give total flexibility for Deep Silicon Etch (DSiE) applications -...
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