Hafnium Oxide Sputter Target [HfO2]

Nano Vacuum

SKU: SP-HFO2-1-8-3N5

Diameter 1" [25.4mm] 2" [50.8mm] 3" [76.2mm] 4" [101.6mm]

Thickness 1/8" [3mm] 1/8" [Bonded]

Purity 99.95%

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Hafnium Oxide [HfO2] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.
Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.
Available in pre-bonded assemblies with OFHC Cu backing plate and indium bonding. Please note that the Cu backing plate will add another 1/8" (3mm) to the target thickness (Total Target Thickness = 1/4" or 6.35mm).
If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation.
All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.
Materials are vacuum packed under cleanroom conditions to ensure zero contamination.
If your size, quantity or purity is not available please contact us for a personalised quotation.