Introduction
The flexDEP Physical Vapour Deposition (PVD) system is a modular, flexible, high-vacuum evaporator for metal, dielectrics and/or organic materials.
The system comes as standard with a Siemens PLC industrial controller for reliable software automation. The deposition control is fully automatic with PID loop control for precise thin film thickness determination.
All materials have been carefully selected and engineered for high vacuum compatibility and minimal outgassing for quick pump down times to high vacuum pressure regimes.
A large 22" touch screen HMI allows for easy intuitive control of the vacuum and deposition control operation.
All flexDEP systems are engineered and assembled within our Sydney headquarters and backed by market leading 2 year warranty.
Typical applications include quantum computing, wearable electronics, photovoltaics, MEMs, bio-medical, perovskite solar cells, OLEDs, OPVs, and OFETS. Organic active layers in perovskite solar cells, OLEDs, OPVs, and OFETS.
Specifications
Substrate Size & Uniformity
6" Diameter max or smaller pieces
+/- 5% uniformity across 6" Diameter substrate
Base Pressure
<5x10E-7 mbar/Torr (Turbo Pump)
<5x10E-8 mbar/Torr (Cryo Pump)
Deposition Source Types
Resistive Thermal Evaporation
Magnetron Sputtering
E-Beam Evaporation (single or multi-pocket)
Low-Temperature Organic Evaporation
Substrate Temperature Options
Heating = up to +300C / +500C / +800C
Cooling = down to room temperature / -10C / -150C
Various other heating/cooling ranges available on request
Options Available
Load Lock (single load or cassette)
Ion Assisted Deposition/Etching
RF/DC substrate bias
Residual Gas Analyser
Cooled vacuum chamber
Chamber bakeout
Glancing Angle Deposition Stage (substrate tilt & rotation)
Standards
AS3000 Australian wiring and safety standards
Control System
Siemens S7 PLC with safety relays
Warranty
2 Years
Country of Manufacture
Australia