Indium Tin Oxide Sputter Target [ITO] In2O3/SnO2 90/10 WT%

Indium Tin Oxide [ITO] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Composition is (In2O3/SnO2 90/10 WT%). Custom compositions on request.
Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.
Available in pre-bonded assemblies with OFHC Cu backing plate and indium bonding. Please note that the Cu backing plate will add another 1/8" (3mm) to the target thickness (Total Target Thickness = 1/4" or 6.35mm).
If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation.
All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.
Materials are vacuum packed under cleanroom conditions to ensure zero contamination.
If your size, quantity or purity is not available please contact us for a personalised quotation.