Benchtop, turnkey system for high performance RF and DC magnetron sputtering for metals and insulating materials. Compact as an electron microscopy coater, but with high-end hardware for research-grade results.

The nanoPVD-S10A is a magnetron sputtering system compact enough to be located benchtop, but that can be fitted with DC and/or RF power supplies (i.e., for deposition of metals or insulating materials such as oxides or nitrides). Magnetrons (up to 3 can be fitted) are water-cooled, allowing for high powers and sustained operation, and sized for accepting industry-standard targets. Units have turbomolecular pumping systems for low-contamination operation. Co-deposition is possible, as is reactive sputtering via the gas/pressure control module that can support up to 3 process gases.

Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4" diameter.

The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.

Key features:

Benchtop configuration
Water-cooled magnetron sputtering sources for industry-standard 2" targets
MFC-controlled process gases
DC and/or RF power supplies
Fully automatic operation via touchscreen HMI
Define/save multiple process recipes
Up to 4” diameter substrates
Base pressures <5 × 10^-7 mbar
Equipped for easy servicing
Comprehensive safety features
Cleanroom compatible
Proven performance

Options:

Available options include:

Dry backing pump
Fast chamber vent
Automatic high-resolution pressure control
Additional process gases
500 °C substrate heating stage
Substrate rotation, Z-shift and shutters
Up to 3 magnetron sputtering sources
RF and/or DC power supplies
SputterSwitch power supply/source switching technology
Co-deposition
Quartz crystal sensor head

Configurations:

Examples of common nanoPVD-S10A configurations are:

Metals deposition: 2 magnetrons with DC power supply and SputterSwitch module for shared output, substrate Z-shift and bi-shutter for best 4" substrate geometries, quartz crystal sensor head for rate/thickness calibration.
TCO/dielectrics sputtering: 2 magnetrons with RF power supply and SputterSwitch module for shared output, substrate heating and additional oxygen process gas line for enhanced film properties, substrate Z-shift and bi-shutter. Quartz crystal sensor head.
Reactive/co-deposition: 3 magnetrons with RF and DC power supplies and SputterSwitch module for fully-flexible power supply/source routing. 3 process gases (argon, oxygen and nitrogen) for reactive deposition of oxides and nitrides.

Call us today to discuss your requirements!

Service Requirements:

All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power.

Exact requirements will be provided with quotations or on request.

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Locations

AUSTRALIA:Head Office6/5 Salisbury Road Castle Hill NSW 2154FREE CALL: 1800 560 820 NEW ZEALAND: Suite 895217B Farnham Street Parnell Auckland 1052 FREE CALL: 0800 251 941

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AUSTRALIA:
Head Office
6/5 Salisbury Road
Castle Hill
NSW 2154

FREE CALL: 1800 560 820

NEW ZEALAND:
Suite 8952
17B Farnham Street
Parnell
Auckland 1052

FREE CALL: 0800 251 941