The nanoETCH implements Moorfield's unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package.
Developed in collaboration with the Nobel Prize-winning group at Manchester University, UK, soft-etching technology from Moorfield is focused on the provision of low plasma powers, with high control resolution. As a result, and in contrast to conventional etching solutions, the tool enables high-performance for key applications in graphene and 2D materials:
- Substrate preparation for flake exfoliation: Large-area flakes through surface conditioning
- Clean material patterning: Graphene removal without resist residues
- Defect engineering: Creating defects in graphene layers
During operation, the nanoETCH supplies process gas through MFCs. These, along with all other hardware, are controlled manually or automatically (recipe-based) via the touchscreen HMI. The system can be connected to a PC for data-logging.
The nanoETCH tool is now installed in leading graphene/2D material research labs, including ICFO (Spain), the Cambridge Graphene Centre and the UK National Graphene Institute.