- 3D Metrology
- Lithography - Direct Write
- Leak Detectors
- MEMS High Vacuum Sealers
- Portable Cleanrooms
- Rapid Thermal Annealing Ovens
- Reflow Solder Systems
- Residual Gas Analyzer
- Solvent Purification
- Surface Science
- Thin Film Materials
- Wire & Die Bonders
- THz-TDS Characterisation
CVD is a well established technique for deposition of a wide variety of films with different compositions and thicknesses down to a single layer of atoms.
- Substrate sits directly on electrode which can be heated up to 1200˚C
- Gas injected into process chamber via “showerhead” gas inlet in the top electrode
- Solid/liquid precursor delivery system for novel processes such as 2D materials MOCVD, ZnO nanowire CVD etc.
- Automatic load lock to transfer sample directly on to a hot table and save time on heating and cooling.
- Plasma enhancement options for lower temperature deposition or plasma assisted conversion or functionalization as well as chamber cleaning.
- Wide range of processes possible in the same chamber
Features & Benefits
- Up to 1200˚C table temperature
- Direct and remote plasma enhancement options
- Operating pressures up to 5 Torr (higher possible)
- Dry plasma cleaning process with end-point control removes or reduces need for physical/chemical chamber cleaning
- Multiple heated/cooled liquid/solid precursors delivery system in addition to 12 gas delivery lines.
- Offers a wide range of material deposition, including:
- Si based PECVD/ICP CVD processes and high temperature CVD processes in the same chamber
- 1D materials growth such as Carbon nanotubes, ZnO nanowires and Si Nanowires
- 2D materials growth such as Graphene, hBN, MoS2/WS2 and other transition metal dichalcogenides (TMDCs)
CVD/PECVD Tools 1D/2D Nanomaterials
Onyx is the first THz-TDS system in the market designed to provide a full-area non-destructive characterization of Graphene, thin-films,...
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