CVD/PECVD Tools 1D/2D Nanomaterials

2 products

    CVD is a well established technique for deposition of a wide variety of films with different compositions and thicknesses down to a single layer of atoms.


    • Substrate sits directly on electrode which can be heated up to 1200˚C
    • Gas injected into process chamber via “showerhead” gas inlet in the top electrode 
    • Solid/liquid precursor delivery system for novel processes such as 2D materials MOCVD, ZnO nanowire CVD etc.
    • Automatic load lock to transfer sample directly on to a hot table and save time on heating and cooling.
    • Plasma enhancement options for lower temperature deposition or plasma assisted conversion or functionalization as well as chamber cleaning.
    • Wide range of processes possible in the same chamber

    Oxford Instruments Nanofab 1D/2D CVD Tool

    Features & Benefits

    • Up to 1200˚C table temperature
    • Direct and remote plasma enhancement options
    • Operating pressures up to 5 Torr (higher possible)
    • Dry plasma cleaning process with end-point control removes or reduces need for physical/chemical chamber cleaning 
    • Multiple heated/cooled liquid/solid precursors delivery system in addition to 12 gas delivery lines.
    • Offers a wide range of material deposition, including:
      • Si based PECVD/ICP CVD processes and high temperature CVD processes in the same chamber
      • 1D materials growth such as Carbon nanotubes, ZnO nanowires and Si Nanowires
      • 2D materials growth  such as Graphene, hBN, MoS2/WS2 and other transition metal dichalcogenides (TMDCs)
    Oxford Instruments Nanofab 1D/2D CVD Tool
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