IR-300

Vapor Concentration Monitor

The Metal-Organic Chemical Vapor Deposition (MOCVD) process is widely used in the manufacture of LEDs, optical devices and other components. Liquid and solid precursors are delivered to the reaction chamber by controlling the temperature, pressure and the carrier gas flow rate (bubbling method). The in-line IR-300 Series measures and reports the precursor concentration in real time giving the user the following benefits:

• Optimise process control to produce more high-grade devices
• Improve device yield and reduce scrap
• Improve reproducibility
• Know when a bubbler will require exchanging
• Extend MTTA
• Reduce unplanned interventions
• Reduce valuable precursor waste

ADVANTAGE

• Real-time monitoring
  
• Multi-calibration Curve Function (Optional)
  
• Multi-display Function
  
• Communications Function
  
• Simple, Compact Design
  
  

A high optical intensity and long-life light source combined with high-speed signal processing enables the IR-300 Series to achieve faster, more repeatable responses to changes in precursor concentration.