Benchtop, turnkey system for high performance RF and DC magnetron sputtering for metals and insulating materials. Compact as an electron microscopy coater, but with high-end hardware for research-grade results.

The nanoPVD-S10A is a magnetron sputtering system compact enough to be located benchtop, but that can be fitted with DC and/or RF power supplies (i.e., for deposition of metals or insulating materials such as oxides or nitrides). Magnetrons (up to 3 can be fitted) are water-cooled, allowing for high powers and sustained operation, and sized for accepting industry-standard targets. Units have turbomolecular pumping systems for low-contamination operation. Co-deposition is possible, as is reactive sputtering via the gas/pressure control module that can support up to 3 process gases.

Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4" diameter.

The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features. 

Key features:

• Benchtop configuration
• Water-cooled magnetron sputtering sources for industry-standard 2" targets
• MFC-controlled process gases
• DC and/or RF power supplies
• Fully automatic operation via touchscreen HMI
• Define/save multiple process recipes
• Up to 4” diameter substrates
• Base pressures <5 × 10^-7 mbar
• Equipped for easy servicing
• Comprehensive safety features
• Cleanroom compatible
• Proven performance 

Options:

Available options include:

• Dry backing pump
• Fast chamber vent
• Automatic high-resolution pressure control
• Additional process gases
• 500 °C substrate heating stage
• Substrate rotation, Z-shift and shutters
• Up to 3 magnetron sputtering sources
• RF and/or DC power supplies
• SputterSwitch power supply/source switching technology
• Co-deposition
• Quartz crystal sensor head 

Configurations:

Examples of common nanoPVD-S10A configurations are:

• Metals deposition: 2 magnetrons with DC power supply and SputterSwitch module for shared output, substrate Z-shift and bi-shutter for best 4" substrate geometries, quartz crystal sensor head for rate/thickness calibration.
• TCO/dielectrics sputtering: 2 magnetrons with RF power supply and SputterSwitch module for shared output, substrate heating and additional oxygen process gas line for enhanced film properties, substrate Z-shift and bi-shutter. Quartz crystal sensor head.
• Reactive/co-deposition: 3 magnetrons with RF and DC power supplies and SputterSwitch module for fully-flexible power supply/source routing. 3 process gases (argon, oxygen and nitrogen) for reactive deposition of oxides and nitrides.

Call us today to discuss your requirements! 

Service Requirements:

All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power.

Exact requirements will be provided with quotations or on request.