Benchtop CVD system for rapid, on-demand synthesis of high-quality graphene. Fully automated cold-wall technology for reduced contamination and running costs, and enhanced conditions control.

Developed in collaboration with academic groups, the nanoCVD-8G provides precise control over conditions such as pressure, temperature and gas chemistry that are critical for successful production of graphene. The units implement the cold-wall variant of the CVD method, enabling reduced contamination, low running costs and better control as compared to tube-furnace counterparts.

User operation is via a touchscreen HMI and is recipe-based, with all hardware being fully automated. Comprehensive safety features protect users and the system itself. Included PC software enables data-logging and offline recipe definition. All units come with expert support.

Systems are quick to install and ideal for research groups requiring ongoing rapid access to high-quality graphene for R&D applications. 

Key Features:

• Ultra-compact, benchtop, low-pressure CVD system
• Reproducible synthesis of high-quality graphene
• Precise control of conditions
• 1100 °C maximum temperature
• MFC-controlled process gases (argon, hydrogen and methane)
• 20 × 40 mm² maximum substrate size
• Process times <30 minutes
• Fully-automatic
• User-friendly, touchscreen interface
• Define/save multiple growth recipes
• PC connection for data-logging
• Equipped for easy servicing
• Comprehensive safety features
• Cleanroom compatible
• Proven performance 

Options:

The nanoCVD-8G is available with a rotary or scroll (dry) backing pump. 

Service Requirements:

The nanoCVD-8G requires inert service gas, high-purity process gases (argon, hydrogen and methane) and electrical power.