Name: Gas Monitor for Chamber Cleaning End Point Monitoring_IR-400
Brand: Horiba
SKU: IR-400
Availability: OutOfStock

Gas Monitor for Chamber Cleaning End Point Monitoring_IR-400-Nano Vacuum Australia and New Zealand

Your inquiry was submitted successfully. You can expect to hear from us shortly.

IR-400

High-grade type Gas Monitor for Chamber Cleaning End Point Monitoring

The IR-400 offers real-time monitoring of the chamber cleaning end point during the deposition process. By optimizing the cleaning process, the IR-400 reduces cleaning time and gas usage. This reduction in cleaning gas usage leads to a reduction in chamber damage and increases the life times of all the systems components.

ADVANTAGE

Multi gas monitoring (Supported SiF₄andCF₄) (IR-422)
High sensitivity
Gas cell heating function up to 180 dec.C
Multi-display
Analog/Digital communication.

BENEFIT

Real-time end-point monitoring with the IR-400

Reduce time for chamber cleans
Reduce usage of cleaning gases
Repeatable and predictable clean process
Longer lifetime of chamber components

MEASUREMENT TECHNIQUE

Reliable, High-performance
Non-dispersive Infrared Absorptiometry (NDIR)