Gas Monitor for Chamber Cleaning End Point Monitoring_IR-200
Horiba
SKU: IR-200
IR-200
Gas Monitor for Chamber Cleaning End Point Monitorin
The IR-200 monitors SiF4 gas concentration in real time and identifies the cleaning end-point based on SiF4 gas concentrations.
ADVANTAGE
- Monitor SiF4 concentration up to 5000 ppm
- Compact design
- Can be instralled into exhaust lines
- In addition to SiF4, this gas monitor can be used to measure CIF3 and other gases
SPECIFICATION
| Model name | IR-200 |
|---|---|
| Measurement Gas | SiF4 gas |
| Measurement Range | 0 to 5000ppm(0 to 500Pa) |
| Repeatability |
±1%F.S. |
| Cell length | 30mm, 1.2 in |
| Response Time | 30 seconds or less (T90) |
| Pressure Resistance | 0.3MPa(A) |
| Gas Cell Heating Temperature | 150 ℃ (Max) |
| Contact Material | SUS-316L、BaF2、FKM |
| Leak Rate | 1×10-10Pa・m3/s |
| Fitting | NW25 Flange |
| Analog Output | 4 to 20 mA DC |
| Contact Output | 3 channels (ERR、High、Low) |
| Contact Input | 1 channel for zero calibration |
| Power | 24 V DC, 30 W (Max) |
| Dimension (W x H X D) |
Sensor： 150×268×90mm / 3.5x5.9x10.6 in Controller： 48×96×130mm / 1.9x3.8x5.1 in |
|
Mass |
Sensor：4.5kg / 9.9 lb Controller：0.5kg / 1.1 lb |
