Name: Enviro METROS FAB
Brand: SPECS
Availability: InStock

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The novel EnviroMETROS series provides the perfect routine analysis tools for any sample with a special focus on multilayer thin films and their surfaces by combining small to large sample capabilities or wafer handling with a variable information depth photoelectron spectrometer.

EnviroMETROS is a unique metrology platform for the chemical analysis of ultrathin films and 2D materials that allows a detailed characterization of stoichiometries‚ composition and depth distribution of elements. In combination with optical and other analytical techniques it enables depth dependent composition analysis of unsurpassed precision‚ reliability and repeatability.

KEY FEATURES

Metrology with ultimate stability, reliability and repeatability;
Precise chemical and dimensional quantification
Short acquisition times (high sensitivites and throughput)
Non-destructive depth profiling using different photon energies in combination with angle resolved XPS (ARXPS)
Flexible analysis area (100 µm to 1 mm)
Integration of supplementary optical metrology (IRRAS and Raman)
Electronic structure analysis by combined UPS and IPES
Identification of energy loss mechanisms by REELS
Option to operate the system in UHV or NAP environment
Fully Software Controlled

SPECIFICATIONS

Configuration

System	Automated surface metrology system for (NAP-)XPS, (NAP-)HAXPES, LEISS, Ar_n⁺-Sputter depth profiling, REELS, (NAP-)UPS, IPES, SEM/SAM, Raman and IRRAS Clean room, CE, UL and SEMI compliant
EnviroMETROS FAB 8 and FAB 12 System	Fully automated handling of 200 mm (8″) or 300 mm (12″) wafers Coupling port to any 8″ or 12″ wafer robot chamber (smaller sizes on request) Wafer robot integrated into the system (optional)
Pumping System	Turbomolecular pumps Oil-free backing pumps
Electron spectrometer	From UHV (< 5 × 10-10 mbar) to NAP (50 mbar)
Electron spectrometer	Hemispherical Electron Analyzer (150 mm) with wide angle lens (+/- 30°) AD-CMOS Detector (< 1200 energy channels and < 12 angle channels)
X-Ray Source	Small spot crystal monochromator Spot sizes: < 100 μm to > 1 mm Switchable X-ray energies (Al K_α, Ag L_α, Cr K_α)
Charge neutralization	Dual beam charge neutralization (UHV) Environmental charge compensation (NAP)
SEM/SAM	Imaging with 1 μm lateral resolution
Sputter depth profiling	Monoatomic (0.2 – 5 keV) Ar-Cluster (up to 10 keV, optional)
LEISS	He⁺ ion scattering spectroscopy (0.2 – 5 keV)
(NAP-)UPS	Small spot UV discharge source
IPES	Low energy BIS (5 – 15 eV)
REELS	Electron energies (0.1 – 5 keV)
Raman/IRRAS	Integrated in measurement position
Gas dosing system	Automatic inlet for 3 gases (optional)
Automation	Full automation of vacuum system, sample transfer, data analysis, reporting
Software	Keystone M for vacuum control, sample transfer, sample analysis and reporting ISQAR and ITFAP packages integrated for data evaluation and depth profiling
Wafer size	200 mm or 300 mm
Samples	Wafers or wafer size adapter plates for wafer coupons
Electrical contacts	Wafer potential contact
Sample stage	Fully motorized, non-magnetic, UHV/NAPcompatible and computer controlled three axis wafer stage for full 200 mm / 300 mm lateral motion and 10 mm vertical motion

MADE FOR THESE METHODS

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