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New Product: Prevac 032 PRIMS Sputter Deposition System

032 PRIMS is a simple and full functional sputter deposition system for reproducible thin film layers applying. 

 

Magnetron sputtering sources (for metals and inorganics) are included, mounted in sputter-down configuration. System includes a turbomolecular pump with manual throttle valve. Small process chamber size allows to reach the base pressure in a short time. Dedicated deposition rate checking system is available. 

 
▪ Compact size design 
▪ Process chamber diameter: Ø 355 mm 
▪ Ports for up to three 2" magnetron sources 
▪ Internal shield against chamber contamination 
▪ Base pressure range 10-7 mbar 
▪ Fast turbo-molecular pumping system 
▪ Substrate stage for up to 2" diameter samples 
▪ Process chamber with in full size vacuum door for easy target or substrate replacement 

 

Options: 
▪ Substrate heating up to 600 °C 
▪ Sample/substrate stage rotation 
▪ Deposition rate measurement 
▪ Co-deposition 
▪ Process automation 
 
System is equipped with MS2 63C1 magnetron sources and novel M600DC-PS power supply. 

  • Sep 21, 2020
  • Category: News
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